Thierry Fried

Title: Thierry Fried - Innovator in Semiconductor Etching Technology

Introduction

Thierry Fried is a notable inventor based in Grenoble, France. He has made significant contributions to the field of semiconductor technology, particularly in the area of etching processes. His innovative work has led to the development of a patented process that enhances the efficiency and selectivity of tungsten silicide etching.

Latest Patents

Thierry Fried holds a patent for a "Tungsten silicide etch process selective to photoresist and oxide." This process involves etching tungsten silicide on a semiconductor wafer within a vacuum etch chamber using a plasma. The etching process utilizes chlorine (Cl.sub.2) and oxygen-bearing etchant gases in a specific ratio, ensuring high selectivity for both photoresist and oxide. This innovative method is capable of etching polysilicon and demonstrates a remarkable efficiency in semiconductor manufacturing.

Career Highlights

Thierry Fried is associated with Applied Materials, Inc., a leading company in the semiconductor equipment industry. His work at Applied Materials has allowed him to contribute to advancements in semiconductor fabrication technologies. With a focus on improving etching processes, he has played a crucial role in enhancing the performance and reliability of semiconductor devices.

Collaborations

Thierry has collaborated with esteemed colleagues, including Robert T Lum and Chester A Szwejkowski. These collaborations have fostered an environment of innovation and have led to the development of cutting-edge technologies in the semiconductor field.

Conclusion

In summary, Thierry Fried is a prominent inventor whose work in semiconductor etching processes has made a significant impact on the industry. His patented technology continues to influence advancements in semiconductor manufacturing, showcasing his dedication to innovation and excellence.