Adelebsen, Germany

Theodor Rottwinkel

This inventor holds 1 USPTO granted patent. Top assignee: Novelis, Inc.. Active years: 2007.


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2007

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1 patent (USPTO):Explore Patents

Title: Theodor Rottwinkel: Innovator in Aluminum Alloy Technology

Introduction

Theodor Rottwinkel is a notable inventor based in Adelebsen, Germany. He has made significant contributions to the field of materials science, particularly in the development of aluminum alloys. His innovative work has led to the creation of a specialized aluminum alloy sheet that is suitable for use as lithographic plate support.

Latest Patents

Rottwinkel holds a patent for an aluminum alloy sheet characterized by a specific composition. The alloy includes silicon (Si) at 0.05-0.20 wt. %, preferably 0.06-0.14; iron (Fe) at 0.15-0.40 wt. %, preferably at least 0.2; and other elements up to 0.05 each and up to 0.15 total, with aluminum (Al) as the balance. This aluminum alloy sheet is notable for being non-grain refined, which enhances its suitability for lithographic applications. He has 1 patent to his name.

Career Highlights

Theodor Rottwinkel is currently employed at Novelis, Inc., a leading company in aluminum manufacturing and recycling. His work at Novelis has allowed him to focus on innovative solutions in aluminum technology, contributing to the company's reputation for excellence in the industry.

Collaborations

Throughout his career, Rottwinkel has collaborated with talented professionals, including Paul Vincent Evans and Jeremy Mark Brown. These collaborations have fostered a creative environment that encourages innovation and the development of new technologies.

Conclusion

Theodor Rottwinkel's contributions to aluminum alloy technology exemplify the impact of innovation in materials science. His patent for an aluminum alloy sheet demonstrates his commitment to advancing the field and enhancing industrial applications.

Profile summary based on public USPTO records.
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