Company Filing History:
Years Active: 1979-1980
Title: Thaddaus Kraus: Innovator in Vacuum Technology
Introduction
Thaddaus Kraus is a notable inventor based in Triesen, Liechtenstein. He has made significant contributions to the field of vacuum technology, holding a total of 5 patents. His work primarily focuses on advancements in vacuum evaporation apparatuses and related technologies.
Latest Patents
One of his latest patents is a vacuum evaporation apparatus. This innovative device comprises a housing with walls that define an evacuable evaporation chamber. Within this chamber, an evaporator is positioned below a supporting structure for the substance to be coated. An annular screen is strategically placed around the evaporator, allowing only a specific opening for vapor deposition of the substrates. The screen is made of a heat-conductive material, such as metal, which can be electrically heated.
Another significant patent is the fluid protective wall cover in a vapor deposition chamber. This method involves producing a high vacuum in a vacuum container with an exhaust connection line. It utilizes an interior protective covering for the walls of the container, directing a protective gas into the space between the covering and the inner walls. This process is crucial during the flooding phase when the container is opened, followed by evacuating the interior through the exhaust connection while heating the covering.
Career Highlights
Thaddaus Kraus has had a distinguished career in the vacuum technology sector. He has worked with Balzers Aktiengesellschaft für Hochvakuumtechnik und Dünne Schichten, a company known for its expertise in high vacuum technology and thin film applications. Additionally, he has been associated with Balzers Patent und Beteiligungs AG, further solidifying his reputation in the industry.
Collaborations
Due to space constraints, details about collaborations will not be included.
Conclusion
Thaddaus Kraus is a prominent figure in vacuum technology, with a focus on innovative solutions that enhance vapor deposition processes. His contributions through patents and professional experience reflect his commitment to advancing this critical field.