Muurame, Finland

Teuvo T Huhtala

This inventor holds 1 USPTO granted patent. Top assignee: Oy Safematic Ltd.. Active years: 1984.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Teuvo T Huhtala. Retrieved from https://idiyas.com/inventor/teuvo-t-huhtala

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 1.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 1984

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1 patent (USPTO):Explore Patents

Title: Teuvo T Huhtala: Innovator in Flow Measurement Technology

Introduction

Teuvo T Huhtala is a notable inventor based in Muurame, Finland. He has made significant contributions to the field of flow measurement technology. His innovative designs have paved the way for advancements in measuring liquid flow quantities.

Latest Patents

Huhtala holds a patent for a volume flow meter designed for the measurement of the flow quantity of a liquid. This meter features a cylindrical flow channel with an inlet and outlet for the liquid. It includes an axially moving, spring-loaded indicator piston that shifts based on the flow quantities. The design incorporates an outflow slot that deepens from the inlet to the outlet, enhancing measurement accuracy. Additionally, a reversing valve allows for the guidance of liquid flow, ensuring the indicator piston remains clean from impurities.

Career Highlights

Teuvo T Huhtala is associated with Oy Safematic Ltd., where he has applied his expertise in flow measurement technology. His work has contributed to the development of efficient and reliable measurement devices. His innovative approach has garnered attention in the industry.

Conclusion

Teuvo T Huhtala's contributions to flow measurement technology exemplify the spirit of innovation. His patented designs continue to influence the field, showcasing the importance of precise measurement in various applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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