Eindhoven, Netherlands

Teunis J Hazerdonk

This inventor holds 1 USPTO granted patent. Top assignee: U.S. Philips Corporation. Active years: 1980.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Teunis J Hazerdonk. Retrieved from https://idiyas.com/inventor/teunis-j-hazerdonk

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 1980

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1 patent (USPTO):Explore Patents

Title: Teunis J Hazerdonk: Innovator in Opto-Electronics

Introduction

Teunis J Hazerdonk is a notable inventor based in Eindhoven, Netherlands. He has made significant contributions to the field of opto-electronics, particularly in the area of focussing error detection.

Latest Patents

Hazerdonk holds a patent for an "Opto-electronic focussing error detection arrangement." This invention describes a system designed to detect deviations between a radiation reflecting surface and the plane of focussing of an objective system. The arrangement includes a beam-splitting element positioned in the path of the reflected beam, with two radiation-sensitive detectors arranged behind it. These detectors are grating-shaped and divided into two sections by adjustable selection devices. The resulting focussing error signal is highly independent of any positional errors of the detection system relative to the beam axis.

Career Highlights

Teunis J Hazerdonk is associated with U.S. Philips Corporation, where he has applied his expertise in opto-electronics. His work has contributed to advancements in technology that enhance the precision of optical systems.

Collaborations

Hazerdonk has collaborated with Gijsbertus Bouwhuis, furthering innovations in their field.

Conclusion

Teunis J Hazerdonk's work in opto-electronics exemplifies the impact of innovative thinking in technology. His contributions continue to influence advancements in focussing error detection systems.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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