Ichikawa, Japan

Tetsuya Ueda



Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Location History:

  • Ichikawa, JP (2015)
  • Hiratsuka, JP (2019)

Company Filing History:


Years Active: 2015-2019

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2 patents (USPTO):Explore Patents

Title: Tetsuya Ueda: Innovator in Waste Liquid Treatment and Platinum Recovery

Introduction

Tetsuya Ueda is a notable inventor based in Ichikawa, Japan. He has made significant contributions to the field of waste liquid treatment and the recovery of platinum group elements. With a total of 2 patents to his name, Ueda's work reflects his commitment to innovation and environmental sustainability.

Latest Patents

Ueda's latest patents include a waste liquid treatment device and a waste liquid treatment method. The waste liquid treatment device is designed to treat water containing hydrogen peroxide by decomposing it. This device features a housing with an introduction port for the water to be treated, a discharge port for the treated water, and one or more channel-defining members that facilitate the treatment process. The method of recovering platinum group elements involves unevenly distributing a specific element in a copper phase, which enhances the distribution ratio of rhodium in the molten copper phase.

Career Highlights

Throughout his career, Ueda has worked with prominent companies such as Tanaka Kikinzoku Kogyo K.K. and Dowa Metals & Mining Co., Ltd. His experience in these organizations has contributed to his expertise in the field of materials science and waste management.

Collaborations

Ueda has collaborated with notable coworkers, including Yuzuru Nakamura and Minoru Kawasaki. These partnerships have likely enriched his research and development efforts, leading to innovative solutions in his areas of expertise.

Conclusion

Tetsuya Ueda's contributions to waste liquid treatment and platinum recovery demonstrate his innovative spirit and dedication to environmental solutions. His patents reflect a deep understanding of chemical processes and a commitment to advancing technology in these critical areas.

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