Company Filing History:
Years Active: 2024
Title: Tetsuya Tanaka: Innovating Silica-Based Particle Dispersions
Introduction
Tetsuya Tanaka, an accomplished inventor based in Kitakyushu, Japan, has made significant contributions in the field of materials science. His notable work focuses on enhancing silica-based particle dispersion, which offers advanced solutions for polishing substrates.
Latest Patents
Tanaka holds a patent for a groundbreaking invention titled "Silica-based particle dispersion and production method therefor." This innovative silica-based particle dispersion composition achieves a high polishing rate and exceptional surface precision on silica-based or NiP-plated substrates. The invention specifically details a silica-based particle group that includes both irregularly-shaped and non-irregularly-shaped silica-based particles. Notably, the irregularly-shaped particles contain multiple small holes in their structure, overlain by a silica covering. The specifications of the particle group include an average particle size of 100-600 nm and certain morphological characteristics, such as an irregular-shape degree that ranges between 1.1 and 5.0 when analyzed.
Career Highlights
Tanaka is currently employed at JGC Catalysts & Chemicals Ltd., a prominent company known for its innovations in chemical and catalyst technologies. His expertise in silica-based materials has led to the development of cutting-edge technologies that cater to a variety of industrial applications.
Collaborations
Throughout his career, Tetsuya Tanaka has collaborated with noteworthy colleagues, including Michio Komatsu and Kazuhiro Nakayama. These collaborations have undoubtedly contributed to the advancement of their research and development efforts, further enriching the field of material sciences.
Conclusion
With a strong focus on innovations in silica-based materials, Tetsuya Tanaka's work exemplifies the spirit of invention and its practical applications in industry. His patented technology not only highlights his inventive prowess but also sets new standards for advancing polishing methodologies in various substrates. As he continues to push the boundaries of material science, Tanaka's contributions will undoubtedly leave a lasting impact on the industry.