The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 06, 2024
Filed:
Oct. 04, 2019
Jgc Catalysts and Chemicals Ltd., Kawasaki, JP;
Michio Komatsu, Fukuoka, JP;
Kazuhiro Nakayama, Kitakyushu, JP;
Tetsuya Tanaka, Kitakyushu, JP;
Yuji Tawarazako, Kitakyushu, JP;
Tatsuya Mukai, Kitakyushu, JP;
Yuki Miwa, Kitakyushu, JP;
JGC CATALYSTS AND CHEMICALS LTD., Kawasaki, JP;
Abstract
A silica-based particle dispersion including a silica-based particle group and a high polishing rate and high surface precision is achieved to a silica-based substrate or a NiP-plated substrate to be polished or the like. A silica-based particle dispersion containing a group including irregularly-shaped and non-irregularly-shaped silica-based particles, wherein the irregularly-shaped silica-based particles each have a plurality of small holes thereinside and a covering silica layer which covers the core, and the silica-based particle group satisfies [1]-[3]. [1] Having an average particle size (D) of 100-600 nm, and a particle size (D) of 30-300 nm in terms of specific surface area. [2] An irregular-shape degree D (D=D/D) represented by the average particle size (D) and a projected area-equivalent particle size (D) being in the range of 1.1-5.0. [3] When waveform separation is performed on a volume-reference particle size distribution, a multi-peak distribution in which three or more peaks are detected.