Nara, Japan

Tetsuya Nakabayashi

This inventor holds 1 USPTO granted patent. Top assignee: Sharp Kabushiki Kaisha Corporation. Active years: 2004.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tetsuya Nakabayashi. Retrieved from https://idiyas.com/inventor/tetsuya-nakabayashi-m3oj2d6a

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2004

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1 patent (USPTO):Explore Patents

Title: Tetsuya Nakabayashi: Innovator in Liquid Crystal Technology

Introduction

Tetsuya Nakabayashi is a notable inventor based in Nara, Japan. He has made significant contributions to the field of liquid crystal technology, particularly in the area of thin film deposition apparatus.

Latest Patents

One of his key patents is titled "Susceptor and surface processing method." This invention involves a susceptor that serves as a base for a liquid crystal substrate within a vacuum chamber of a thin film deposition apparatus. The susceptor features a main body and a stepped portion designed to support the substrate from below. The stepped portion is smaller than the substrate, which helps prevent conduction between the film formed at the substrate's end plane and the film around it. Tetsuya Nakabayashi holds 1 patent.

Career Highlights

Tetsuya Nakabayashi is associated with Sharp Kabushiki Kaisha Corporation, where he has been instrumental in advancing liquid crystal technologies. His work has contributed to the development of more efficient and effective thin film deposition processes.

Collaborations

He has collaborated with notable coworkers such as Masafumi Kokura and Kazuyuki Zaitsu, enhancing the innovation landscape within his field.

Conclusion

Tetsuya Nakabayashi's contributions to liquid crystal technology and his innovative patent demonstrate his commitment to advancing the industry. His work continues to influence the development of new technologies in this area.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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