Sakai, Japan

Tetsuya Maruno

This inventor holds 1 USPTO granted patent. Top assignee: Sharp Kabushiki Kaisha Corporation. Active years: 2017.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tetsuya Maruno. Retrieved from https://idiyas.com/inventor/tetsuya-maruno

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2017

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1 patent (USPTO):Explore Patents

Title: Tetsuya Maruno: Display Panel Protection Innovation

Introduction

Tetsuya Maruno is an inventor associated with Sakai, Japan, and Sharp Kabushiki Kaisha. His recorded patent work includes one patent focused on reducing display-panel deformation and preventing light leakage around the screen.

Latest Patents

Maruno’s patent, “Display apparatus,” describes buffer members positioned against the front and back surfaces around a display panel. The front-side buffer is made of light-shielding material and extends along substantially the full length of at least one side of the rectangular display region. The back-side buffer extends along part of a side while leaving both end portions uncovered. This arrangement helps reduce panel deformation and prevent light leakage at the display’s periphery.

Career Highlights

Maruno’s recorded patent contribution addresses practical challenges in display construction, combining mechanical support with light shielding. His work is associated with Sharp Kabushiki Kaisha, a company known for display technologies.

Collaborations

The provided information lists Yusuke Masuda and Michio Yamamoto as Maruno’s coworkers. It does not specify whether they collaborated with him on this patent.

Conclusion

Tetsuya Maruno’s recorded invention demonstrates a focused approach to improving display durability and image quality through carefully positioned buffer members.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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