Kasugai, Japan

Tetsuya Ishikawa



Average Co-Inventor Count = 2.7

ph-index = 1

Forward Citations = 2(Granted Patents)


Location History:

  • Nagoya, JP (2014)
  • Kasugai, JP (2016 - 2020)

Company Filing History:


Years Active: 2014-2020

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4 patents (USPTO):Explore Patents

Title: Tetsuya Ishikawa: Innovator in Gas Sensor Technology

Introduction

Tetsuya Ishikawa is a notable inventor based in Kasugai, Japan. He has made significant contributions to the field of gas sensor technology, holding a total of 4 patents. His innovative designs and methods have advanced the capabilities of gas sensors, making them more efficient and effective.

Latest Patents

Ishikawa's latest patents include a groundbreaking gas sensor design. This design features an inner protective cover that forms an element-chamber inlet with multiple openings. The configuration allows for a measurement-object gas to travel through a first gas chamber, optimizing the sensor's performance. Another patent details a method for processing gas sensors, utilizing an oxygen ion conductive solid electrolyte. This method involves applying a predetermined voltage across electrodes to pump oxygen out of the internal space, enhancing the sensor's functionality.

Career Highlights

Throughout his career, Tetsuya Ishikawa has worked with prominent companies such as NGK Insulators, Inc. and NGK Ceramic Device Co., Ltd. His experience in these organizations has allowed him to refine his skills and contribute to significant advancements in gas sensor technology.

Collaborations

Ishikawa has collaborated with talented individuals in his field, including Yosuke Adachi and Jumpei Tanaka. These partnerships have fostered innovation and have led to the development of cutting-edge technologies in gas sensing.

Conclusion

Tetsuya Ishikawa's contributions to gas sensor technology are noteworthy and impactful. His patents and career achievements reflect his dedication to innovation in this vital field. His work continues to influence advancements in gas sensing applications.

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