Kyoto, Japan

Tetsuya Igo


Average Co-Inventor Count = 2.6

ph-index = 3

Forward Citations = 26(Granted Patents)


Company Filing History:


Years Active: 2010-2015

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7 patents (USPTO):Explore Patents

Title: Tetsuya Igo: Innovator in Ion Implantation Technology

Introduction

Tetsuya Igo is a prominent inventor based in Kyoto, Japan, known for his significant contributions to the field of ion implantation technology. With a remarkable seven patents to his name, Igo's work has played a crucial role in advancing the efficiency and effectiveness of ion beam systems used in various applications.

Latest Patents

Igo's latest innovations include an impressive ion beam line, where he has developed a system featuring an ion source responsible for generating a ribbon ion beam. This system is equipped with a corrector device designed to adjust the current density of the ribbon ion beam along its longitudinal dimension, ensuring a uniform current density profile. Additionally, the system incorporates components such as an analyzer magnet and electrostatic bend and focusing lenses, which optimize the shape and trajectory of the ion beam for precise application on substrates.

Another noteworthy patent focuses on a repeller structure within a plasma generating chamber of an ion source. This innovative structure is designed to reflect ions towards a cathode that emits electrons to ionize a source gas. The repeller structure includes a sputtering target that is crucial for emitting predetermined ions, highlighting Igo's expertise in enhancing ion source designs.

Career Highlights

Igo's journey as an inventor has been marked by a commitment to improving ion implantation processes, making him an invaluable asset to his company, Nissin Ion Equipment Co., Ltd. His contributions have not only advanced the technology but have also expanded the capabilities of ion implantation in various industries.

Collaborations

Igo has collaborated with notable colleagues in the field, including Tadashi Ikejiri and Takatoshi Yamashita. Together, they have worked on projects that push the boundaries of ion beam technology, fostering an environment of innovation and discovery.

Conclusion

In summary, Tetsuya Igo stands out as a leading inventor in the realm of ion implantation technology. With his numerous patents and collaborative efforts, he continues to influence the industry, paving the way for future advancements. His work exemplifies the essence of innovation and the importance of research in driving technological progress.

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