Tokyo, Japan

Tetsuro Kadowaki

This inventor holds 1 USPTO granted patent. Top assignee: Hitachi High-Tech Corporation. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tetsuro Kadowaki. Retrieved from https://idiyas.com/inventor/tetsuro-kadowaki

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 1.0

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Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Tetsuro Kadowaki: Inventor of a High-Throughput Charged Particle Beam Apparatus.

Introduction

Tetsuro Kadowaki is an inventor based in Tokyo, Japan, and is associated with Hitachi High-Tech Corporation. His work includes an invention designed to improve the efficiency of sample measurement using charged particle beam equipment.

Latest Patents

Kadowaki is named on one patent, 1 patent: “Charged Particle Beam Apparatus.” The invention uses a correction value table linked to a measurement recipe. When the apparatus runs the recipe on a first sample, its computer system records adjustments to imaging conditions at multiple measurement points. When measuring a different sample, the system uses those stored adjustments to set imaging conditions at corresponding points. This approach is intended to reduce measurement time and support higher-throughput sample analysis.

Career Highlights

Kadowaki’s listed patent reflects work on measurement automation and the reuse of imaging-condition adjustments across samples. The invention is associated with Hitachi High-Tech Corporation.

Collaborations

Kadowaki’s listed coworkers include Takeyoshi Ohashi and Takuma Yamamoto. The available information identifies them as coworkers but does not specify their roles in the patent.

Conclusion

Tetsuro Kadowaki’s patent describes a practical method for streamlining charged particle beam measurements by applying stored imaging adjustments to subsequent samples.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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