Hamamatsu, Japan

Tetsuro Endo

This inventor holds 1 USPTO granted patent. Top assignee: Hamamatsu-Photonics K.k.. Active years: 2009.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tetsuro Endo. Retrieved from https://idiyas.com/inventor/tetsuro-endo-epobmy5c

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 11(Granted Patents)


Company Filing History:


Years Active: 2009

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1 patent (USPTO):Explore Patents

Title: Tetsuro Endo: Innovator in X-ray Technology

Introduction

Tetsuro Endo is a prominent inventor based in Hamamatsu, Japan. He is known for his significant contributions to the field of X-ray technology. His innovative work has led to the development of a unique X-ray tube that enhances the efficiency of X-ray extraction.

Latest Patents

Tetsuro Endo holds a patent for an advanced X-ray tube. The invention relates to an X-ray tube capable of efficiently extracting low-energy X-rays while maintaining excellent durability. The design incorporates a silicon foil with a thickness between 3 µm and 30 µm, which serves as a transmission window for the closed vessel. This innovative structure allows for improved performance in X-ray applications.

Career Highlights

Endo is associated with Hamamatsu Photonics K.K., a company renowned for its advancements in optical technologies. His work at the company has positioned him as a key figure in the development of cutting-edge X-ray equipment.

Collaborations

Throughout his career, Tetsuro Endo has collaborated with notable colleagues, including Tatsuya Matsumura and Tomoyuki Okada. These partnerships have contributed to the success of his projects and innovations.

Conclusion

Tetsuro Endo's contributions to X-ray technology exemplify the impact of innovative thinking in the field. His patented X-ray tube represents a significant advancement that enhances the efficiency and durability of X-ray extraction.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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