Singapore, Singapore

Tetsuo Miyazawa

This inventor holds 1 USPTO granted patent. Top assignee: National University of Singapore. Active years: 2003.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tetsuo Miyazawa. Retrieved from https://idiyas.com/inventor/tetsuo-miyazawa-jj84x0ml

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 11.0

ph-index = 1


Company Filing History:


Years Active: 2003

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1 patent (USPTO):Explore Patents

Title: Tetsuo Miyazawa: Innovator in Optical Stereolithography

Introduction

Tetsuo Miyazawa is a notable inventor based in Singapore, recognized for his contributions to the field of optical stereolithography. His innovative approach has led to advancements in rapid prototyping technologies, particularly in the area of resin curing processes.

Latest Patents

Miyazawa holds a patent for a method titled "Method for determining resin curing areas in an optical stereolithography process." This patent outlines a technique for determining the areas of resin to be cured during the optical stereolithography process. The method involves generating a computer model of the desired shape and dividing it into layers of a specific thickness. It also includes steps to modify 2-D layer data to compensate for oversizing during the curing sequence, ensuring precision in the final product.

Career Highlights

Miyazawa is affiliated with the National University of Singapore, where he continues to engage in research and development in the field of optical technologies. His work has significantly impacted the efficiency and accuracy of rapid prototyping methods.

Collaborations

He has collaborated with esteemed colleagues such as Yeh Ching Andrew Nee and Han Tong Loh, contributing to various projects that enhance the capabilities of stereolithography and related technologies.

Conclusion

Tetsuo Miyazawa's innovative work in optical stereolithography exemplifies the importance of precision in modern manufacturing processes. His contributions continue to influence the field and inspire future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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