Company Filing History:
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1 out of 832,680 Years Active: 2003-2005
Title: Tetsuji Oishi: Innovator in Substrate Treatment Technology
Introduction
Tetsuji Oishi is a notable inventor based in Shizuoka, Japan. He has made significant contributions to the field of substrate treatment technology, holding 2 patents that showcase his innovative approach to enhancing substrate processing.
Latest Patents
Oishi's latest patents include a substrate treatment apparatus and a substrate treatment method. The substrate treatment apparatus features a substrate heating device that maintains the substrate at a temperature higher than room temperature. It also includes a wetting device that produces a wet ozone-containing gas by wetting an ozone-containing gas with a treatment solution. The supply device is designed to deliver the wet ozone-containing gas to a work object on the substrate's surface. Notably, the gas disperser within the supply device has apertures aligned in rows, with adjacent rows not aligned in a direction perpendicular to the rows. This design allows for enhanced gas distribution. Additionally, a gas conduit connects the wetting device to the supply device, while a wet ozone-containing gas heating device ensures that the gas is heated to a temperature at least equal to that of the substrate.
The substrate treatment method complements the apparatus by providing a systematic approach to treating a work object on a substrate. It involves supplying a wet ozone-containing gas, which is wetted with a treatment solution, to the work object. This method also incorporates a substrate heating device and a gas conduit, ensuring efficient treatment of the substrate.
Career Highlights
Throughout his career, Tetsuji Oishi has worked with prominent companies, including Mitsubishi Denki Kabushiki Kaisha. His experience in these organizations has contributed to his expertise in substrate treatment technologies.
Collaborations
Oishi has collaborated with notable coworkers such as Masaki Kuzumoto and Seiji Noda. Their collective efforts have further advanced the field of substrate treatment.
Conclusion
Tetsuji Oishi's innovative patents and career achievements highlight his significant role in the development of substrate treatment technologies. His work continues to influence advancements in this specialized field.
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