Tetsuhiko Teshima

Title: Tetsuhiko Teshima and Implantable Microelectrode Technology

Introduction

Tetsuhiko Teshima is an inventor associated with Munich, Germany, and NTT Research, Inc. His patent work includes technology for implantable microelectrodes designed for use in tissue or in contact with a single cell.

Latest Patents

Teshima is named on 1 patent: “Substrate for an Implantable Microelectrode, Electrode Element, and Electrode System and Its Manufacturing Method.” The invention describes a substrate made from two layers with different swelling capacities. The first layer has a lower swelling capacity than the second, while the second layer includes components that can be photopolymerized and cross-linked. The disclosed design supports an implantable microelectrode substrate, electrode element, and electrode system, along with a method for manufacturing them.

Career Highlights

Teshima’s listed patent reflects work on materials and structures for microelectrodes intended to interface with biological environments. The patent describes how the layers’ compositions and differing swelling behavior contribute to the substrate design.

Collaborations

Teshima’s listed coworker is Lukas Hiendlmeier. The available information identifies both as connected with the patent-related work but does not specify their individual roles or the details of their collaboration.

Conclusion

Tetsuhiko Teshima’s patent focuses on a layered substrate for implantable microelectrodes, combining photopolymerizable materials and controlled swelling properties for biological applications.