Chiba, Japan

Terumasa Mitogawa

This inventor holds 1 USPTO granted patent. Top assignee: Chiba University. Active years: 2021.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Terumasa Mitogawa. Retrieved from https://idiyas.com/inventor/terumasa-mitogawa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2021

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1 patent (USPTO):Explore Patents

Title: Terumasa Mitogawa: Innovator in Metallic Luster Technology

Introduction

Terumasa Mitogawa is a notable inventor based in Chiba, Japan. He has made significant contributions to the field of materials science, particularly in the development of methods for producing articles with a metallic luster. His innovative approach has garnered attention in both academic and industrial circles.

Latest Patents

Mitogawa holds a patent titled "Method for producing articles having a metallic luster, and toners with a metallic luster using the same and a printing method using the same." This patent describes a novel method for creating articles with a metallic gloss without the use of solvents. Additionally, it includes the development of a toner for metallic luster colors and a corresponding printing method.

Career Highlights

Terumasa Mitogawa is affiliated with Chiba University, where he continues to advance research in his field. His work has not only contributed to academic knowledge but has also practical applications in various industries.

Collaborations

Mitogawa has collaborated with esteemed colleagues such as Katsuyoshi Hoshino and Katsuma Miyamoto. These partnerships have further enriched his research and innovation efforts.

Conclusion

Terumasa Mitogawa's contributions to the field of metallic luster technology exemplify the impact of innovative thinking in materials science. His work continues to inspire advancements in both research and practical applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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