Chiba, Japan

Teruki Iwashita

This inventor holds 1 USPTO granted patent. Top assignee: Applied Materials, Inc.. Active years: 2013.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Teruki Iwashita. Retrieved from https://idiyas.com/inventor/teruki-iwashita

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 8.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2013

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1 patent (USPTO):Explore Patents

Title: **Innovator Spotlight: Teruki Iwashita**

Introduction

Teruki Iwashita, an accomplished inventor based in Chiba, Japan, has made significant contributions to the field of semiconductor technology. Working with Applied Materials, Inc., he has pushed the boundaries of innovation with his development of a specialized process kit designed for semiconductor substrate process chambers.

Latest Patents

Iwashita holds one patent titled "Low Profile Process Kit." This patent describes embodiments of process kits specifically intended for substrate supports within semiconductor process chambers. The invention features an annular body that is substantially horizontal, with both inner and outer edges, as well as distinct upper and lower surfaces. Notably, the design incorporates an inner lip positioned close to the inner edge, extending vertically from the upper surface, and an outer lip located near the outer edge on the lower surface. This outer lip conforms to the surface of the substrate support pedestal, enhancing the efficiency of the semiconductor processing. Additionally, the process kit includes an angle on the upper surface, ranging from about 5 to 65 degrees, facilitating better functionality within the chamber.

Career Highlights

Throughout his career at Applied Materials, Inc., Teruki Iwashita has showcased his expertise in semiconductor processing technologies. His innovative approach to designing process kits reflects a deep understanding of the industry's technical demands. Iwashita's work not only contributes to the efficiency of semiconductor manufacturing processes but also reinforces the critical role of innovation in this high-tech arena.

Collaborations

Iwashita collaborates with notable colleagues, including Muhammad M Rasheed and Hiroshi Otake, who also strive to achieve excellence in their respective fields within the company. This synergy among talented professionals enhances the creative environment at Applied Materials, Inc., leading to groundbreaking advancements in technology.

Conclusion

In conclusion, Teruki Iwashita's contributions through his patent on the Low Profile Process Kit reflect his dedication to innovation within semiconductor technologies. As he continues to work with talented colleagues at Applied Materials, Inc., his future endeavors promise to further inspire advancements that drive the industry forward.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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