Chuo-ku, Japan

Teruhisa Shindo

This inventor holds 1 USPTO granted patent. Top assignee: Tdk Corporation. Active years: 2010.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Teruhisa Shindo. Retrieved from https://idiyas.com/inventor/teruhisa-shindo

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2010

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Teruhisa Shindo: Innovator in Thin-Film Magnetic Head Technology

Introduction

Teruhisa Shindo is a prominent inventor based in Chuo-ku, Japan. He is known for his significant contributions to the field of magnetic head technology. With a focus on innovative manufacturing methods, Shindo has made strides in enhancing the performance of thin-film magnetic heads.

Latest Patents

Shindo holds 1 patent for a manufacturing method of a thin-film magnetic head. This patent outlines a comprehensive process that includes laminating and patterning a soft magnetic layer made of iron alloy containing silicon and aluminum. The method also involves several steps such as chemical-mechanical polishing and the formation of various layers to create an effective magnetic head.

Career Highlights

Throughout his career, Teruhisa Shindo has been associated with TDK Corporation, a leading company in electronic components. His work has significantly impacted the development of magnetic recording technologies, making him a key figure in the industry.

Collaborations

Shindo has collaborated with notable colleagues, including Kazuhiko Maejima and Makoto Hasegawa. These partnerships have fostered innovation and advancement in their shared field of expertise.

Conclusion

Teruhisa Shindo's contributions to the manufacturing of thin-film magnetic heads exemplify his dedication to innovation in technology. His work continues to influence the industry and pave the way for future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…