Mentor, OH, United States of America

Tenhong V Lee

This inventor holds 2 USPTO granted patents. Top assignee: Avery Dennison Corporation. Active years: 1996-1997.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tenhong V Lee. Retrieved from https://idiyas.com/inventor/tenhong-v-lee

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 2

Forward Citations = 16(Granted Patents)


Company Filing History:


Years Active: 1996-1997

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2 patents (USPTO):Explore Patents

Title: Innovations of Tenhong V Lee

Introduction

Tenhong V Lee is an accomplished inventor based in Mentor, OH (US). He has made significant contributions to the field of silicone release compositions, holding a total of 2 patents. His work is characterized by innovative approaches to materials that enhance functionality and performance.

Latest Patents

Among his latest patents, Tenhong V Lee has developed a radiation-curable silicone release composition. This composition comprises a mixture of organopolysiloxanes characterized by specific formulations. Another notable patent focuses on radiation-curable silicone-release compositions with high and controlled properties, showcasing his expertise in this specialized area.

Career Highlights

Tenhong V Lee is currently associated with Avery Dennison Corporation, where he continues to push the boundaries of innovation in silicone materials. His work has not only advanced the technology but has also contributed to the company's reputation as a leader in the industry.

Collaborations

Throughout his career, Tenhong has collaborated with notable colleagues, including William E Kidon and Thanh V Nguyen. These partnerships have fostered a creative environment that encourages the exchange of ideas and enhances the development of new technologies.

Conclusion

Tenhong V Lee's contributions to the field of silicone release compositions exemplify his innovative spirit and dedication to advancing technology. His patents reflect a commitment to excellence and a drive to improve material performance in various applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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