Teng Hooi Goh

Title: The Innovations of Teng Hooi Goh

Introduction

Teng Hooi Goh is a notable inventor based in Fremont, California. He has made significant contributions to the field of extreme ultraviolet lithography. His work focuses on improving the quality and efficiency of lithographic processes, which are crucial in semiconductor manufacturing.

Latest Patents

One of Teng Hooi Goh's key patents is titled "Reducing roughness of extreme ultraviolet lithography resists." This patent outlines methods and systems designed to reduce the roughness of EUV resists and enhance etched features. The innovative methods involve depositing a thin film on a patterned EUV resist, ensuring that the stress level of the thin film is less compressive than that of the patterned resist. This approach effectively reduces buckling and bulging, leading to improved performance in lithographic applications. He holds 1 patent in this area.

Career Highlights

Teng Hooi Goh is currently employed at Lam Research Corporation, a leading company in the semiconductor equipment industry. His role at Lam Research allows him to apply his expertise in lithography and contribute to advancements in semiconductor technology.

Collaborations

Throughout his career, Teng Hooi Goh has collaborated with talented individuals such as Xiang Zhou and Yoshie Kimura. These collaborations have fostered innovation and have been instrumental in the development of new technologies in the field.

Conclusion

Teng Hooi Goh's contributions to extreme ultraviolet lithography demonstrate his commitment to advancing semiconductor technology. His innovative approaches and collaborations continue to influence the industry positively.