Teng-fang Kuo

Title: Teng-fang Kuo: Innovator in Epitaxial Deposition Technologies

Introduction

Teng-fang Kuo is a notable inventor based in San Jose, CA (US), recognized for his contributions to the field of epitaxial deposition technologies. With a total of 5 patents to his name, Kuo has made significant advancements in methods and apparatuses for surface preparation prior to epitaxial deposition.

Latest Patents

Kuo's latest patents focus on innovative cleaning methods that enhance the efficiency of epitaxial deposition on substrate surfaces. One of his key patents describes a method of processing a silicon-containing substrate, which involves etching the surface using a plasma etch process. This process utilizes an etching gas mixture that includes chlorine gas and an inert gas, ultimately leading to the formation of an epitaxial layer on the substrate. Another patent elaborates on a similar cleaning method, detailing the use of a fluorine-containing precursor and a hydrogen-containing precursor during the plasma etch process to create an etched surface for optimal epitaxial layer formation.

Career Highlights

Kuo has established himself as a valuable asset in the semiconductor industry, particularly through his work at Applied Materials, Inc. His expertise in epitaxial deposition has positioned him as a leader in developing advanced technologies that are crucial for modern semiconductor manufacturing.

Collaborations

Throughout his career, Kuo has collaborated with esteemed colleagues such as Ping Han Hsieh and Peter Stone. These partnerships have fostered innovation and contributed to the successful development of new technologies in the field.

Conclusion

Teng-fang Kuo's work in epitaxial deposition technologies exemplifies the impact of innovative thinking in the semiconductor industry. His patents and career achievements highlight his commitment to advancing technology and improving manufacturing processes.