Company Filing History:
Years Active: 2009-2020
Title: Innovations and Contributions of Inventor Teng-Chao David Tao
Introduction
Teng-Chao David Tao, an accomplished inventor based in Saugus, MA, has made significant contributions to the field of ion implantation systems. With a total of two patents to his name, his innovations are pivotal in enhancing semiconductor manufacturing processes.
Latest Patents
Tao's latest patents include a "System and method for in-situ beamline film stabilization or removal in the AEF region." This patent describes an ion implantation system where an ion source generates an ion beam and features an angular energy filter (AEF). This system uses a gas source that passivates and/or etches films that reside on the AEF through a chemical reaction, further assisted by heating mechanisms. Additionally, his patent titled "Deposition reduction system for an ion implanter" focuses on controlling the temperature of semiconductor workpieces to minimize deposition rates within an ion implanter. It integrates a faraday flag structure with a thermally conductive base and a cold trap for collecting foreign materials, enhancing efficiency in ion implantation processes.
Career Highlights
Teng-Chao David Tao is currently associated with Axcelis Technologies, Inc., a leader in the field of ion implantation and related semiconductor technologies. His work has played a crucial role in advancing the efficiency and reliability of ion implantation systems, thereby contributing to the overall improvement of semiconductor manufacturing.
Collaborations
Throughout his career, Tao has collaborated with industry professionals such as Philip J. Ring and David Allen Kirkwood. These partnerships have undoubtedly enriched his innovative approaches and have facilitated the development of effective solutions in ion implantation technology.
Conclusion
Teng-Chao David Tao exemplifies the spirit of innovation, with his patents serving as valuable resources in semiconductor technology. His work at Axcelis Technologies, Inc. and his collaborations with fellow professionals underscore his commitment to advancing the field and supporting the evolution of efficient manufacturing processes. The impact of his inventions will continue to resonate in the industry, paving the way for future innovations.