Taichung, Taiwan

Ten-Ken Lin

This inventor holds 1 USPTO granted patent. Top assignee: Industrial Technology Research Institute. Active years: 2009.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ten-Ken Lin. Retrieved from https://idiyas.com/inventor/ten-ken-lin

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2009

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1 patent (USPTO):Explore Patents

Title: Ten-Ken Lin and a Contactless Image Password Lock System

Introduction

Ten-Ken Lin is an inventor associated with Taichung, Taiwan, and the Industrial Technology Research Institute. His work includes an image-based password lock system designed to provide a contactless way to enter and validate a password.

Latest Patents

Lin is credited with 1 patent: “Image Password Lock System by Tracing Position Information of the Organism or Article Feature.” The system uses a photographic device to capture a moving target and produce dynamic image data across a predetermined whole-region shooting range. The range includes a central region and multiple designated password regions. An image-processing device calculates the target image’s center coordinates and compiles a password from its movement positions. The system then displays and validates the password, offering a contactless input method intended to support efficient anti-theft protection.

Career Highlights

Lin’s listed patent reflects an application of image processing and motion tracking to password security. His work is associated with the Industrial Technology Research Institute.

Collaborations

Mau-Shiun Yeh and Cheng-Feng You are identified as Lin’s coworkers.

Conclusion

Ten-Ken Lin’s patent describes a contactless security system that turns a target’s movement into a password, combining image processing with an approach intended to improve convenience and anti-theft protection.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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