Company Filing History:
Years Active: 2025
Title: Tefu Yeh: Innovator in Semiconductor Technology
Introduction
Tefu Yeh is a prominent inventor based in Kaohsiung, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the development of gate structures for transistors. His innovative approach has led to the filing of a patent that showcases his expertise and creativity in this highly technical area.
Latest Patents
Tefu Yeh holds a patent for a method of forming gate structures for n-type and p-type transistors. The patent, titled "Metal gate patterning," outlines a comprehensive process that includes forming an interfacial layer and high-K (HK) dielectric layer for the gate structures. The method also involves the formation of an n-type metal layer over the HK dielectric layer, followed by a hard capping layer that enhances the dielectric layer through fluorine passivation. The patent details the steps for patterning photo resist material, removing layers via wet etching, and insulating gate structures from aluminum oxidation. This innovative method is crucial for advancing semiconductor manufacturing processes.
Career Highlights
Tefu Yeh is currently employed at Taiwan Semiconductor Manufacturing Company Ltd., a leading firm in the semiconductor industry. His work at this prestigious company has allowed him to collaborate with other talented professionals in the field. His contributions have not only advanced his career but have also played a vital role in the company's ongoing success in semiconductor technology.
Collaborations
Tefu Yeh has worked alongside notable colleagues such as Cheng-Chieh Tu and Hao-Hsin Chen. Their collaborative efforts have fostered an environment of innovation and creativity, leading to advancements in semiconductor technology.
Conclusion
Tefu Yeh is a distinguished inventor whose work in semiconductor technology has made a significant impact. His patent for metal gate patterning exemplifies his innovative spirit and technical expertise. As he continues to contribute to the field, his work will undoubtedly influence future developments in semiconductor manufacturing.