Hsinchu, Taiwan

Te Yu Lin

This inventor holds 1 USPTO granted patent. Top assignee: Realtek Semiconductor Inc.. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Te Yu Lin. Retrieved from https://idiyas.com/inventor/te-yu-lin-2f9pkzoa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2025

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Te Yu Lin - Innovator in Image Processing Technology

Introduction

Te Yu Lin is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of image processing. His innovative work has led to the development of a patented technology that enhances display devices.

Latest Patents

Te Yu Lin holds a patent for an "Image processing method, controller, and non-transitory computer readable storage medium." This patent outlines a method that includes several operations. These operations involve acquiring spectrum information from a display device, calculating low blue light parameters, and applying these parameters to reduce blue light hazard intensity in images. This technology aims to improve visual comfort for users.

Career Highlights

Te Yu Lin is currently employed at Realtek Semiconductor Inc., a leading company in the semiconductor industry. His work at Realtek has allowed him to focus on advancing image processing technologies. He has demonstrated a commitment to innovation and excellence in his field.

Collaborations

Te Yu Lin collaborates with FangHsiung Chen, a fellow innovator in the industry. Their partnership has contributed to the development of cutting-edge technologies in image processing.

Conclusion

Te Yu Lin's contributions to image processing technology are noteworthy. His patented methods are paving the way for advancements in display technology. His work continues to impact the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…