Jhubei, Taiwan

Te-Lin Chung

This inventor holds 1 USPTO granted patent. Top assignee: National Applied Research Laboratories. Active years: 2012.


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 63(Granted Patents)


Company Filing History:


Years Active: 2012

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Te-Lin Chung: Innovator in Liquid Level Detection Technology

Introduction

Te-Lin Chung is a notable inventor based in Jhubei, Taiwan. He has made significant contributions to the field of liquid level detection technology. His innovative approach combines image processing with practical applications, showcasing his expertise and creativity.

Latest Patents

Te-Lin Chung holds a patent for a liquid level detection method. This method involves capturing an image of a liquid surface, a structural surface, and graduation markings on the structural surface using an image-capturing device. The initial image is then processed to generate a processed image, from which a level reference value of the liquid surface is obtained. This value represents the height of the liquid surface based on the inherent characteristics of the processed image. Finally, the liquid level is calculated using a relative proportional relation among the level reference value, the overall height of the processed image, and the dimensions of the initial and processed images relative to the graduation markings. He has 1 patent to his name.

Career Highlights

Te-Lin Chung is affiliated with the National Applied Research Laboratories, where he continues to develop and refine his innovative technologies. His work has garnered attention for its practical applications in various industries.

Collaborations

Te-Lin Chung collaborates with talented individuals such as Jyh-Hong Wu and Fang-Pang Lin, who contribute to his projects and enhance the research environment.

Conclusion

Te-Lin Chung's contributions to liquid level detection technology exemplify the impact of innovation in practical applications. His work not only advances technology but also serves as an inspiration for future inventors.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to [email protected]
Loading…