Company Filing History:
Years Active: 2001
Title: Innovator Tayler Bao: Pioneering Advances in PECVD Technology
Introduction
Tayler Bao, a talented inventor based in Da-Liau Kaohsiung, Taiwan, has made significant contributions to the field of plasma-enhanced chemical vapor deposition (PECVD). With one patented invention to his name, Bao is recognized for his innovative approach in improving the efficiency and functionality of PECVD processes.
Latest Patents
Tayler Bao's notable patent is titled "Apparatus and method for electrically isolating an electrode in a PECVD process chamber." This invention represents a novel apparatus designed for depositing films on substrates during the PECVD process. The apparatus features a process chamber with an electrically grounded element and an RF biased electrode closely positioned to the substrate. A critical aspect of Bao’s patent is the insulative element that electrically isolates the electrode from the grounded element, which is crafted from an electrically insulative material. This invention includes at least one feature with a high effective aspect ratio, which plays a crucial role in preventing deposition on the insulative surface, thereby ensuring an electrical discontinuity in any film that may be formed during the deposition process.
Career Highlights
Currently, Tayler Bao is associated with Tokyo Electron Limited, a leader in the semiconductor manufacturing industry. His expertise and innovations in the field of PECVD are influential in advancing deposition technologies, thereby contributing to the growth and development of semiconductor applications.
Collaborations
Throughout his career, Tayler Bao has collaborated with esteemed colleagues, including Gerrit J Leusink and Michael G Ward. These partnerships reflect a commitment to teamwork and the pursuit of innovative solutions within the technology sector.
Conclusion
Tayler Bao exemplifies the spirit of innovation within the semiconductor industry. Through his unique inventions and collaborative efforts, he continues to drive advancements in PECVD technology, showcasing the power of creativity and engineering expertise in shaping the future of manufacturing processes. His contributions not only enhance the functionality of semiconductor devices but also pave the way for future innovations in the field.