Shimotsuga, Japan

Tatuya Wakana

This inventor holds 1 USPTO granted patent. Top assignee: Hiatchi, Ltd.. Active years: 2001.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tatuya Wakana. Retrieved from https://idiyas.com/inventor/tatuya-wakana-gpru4ryp

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 10(Granted Patents)


Company Filing History:


Years Active: 2001

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1 patent (USPTO):Explore Patents

Title: Tatuya Wakana: Innovator in Rotary Compressor Technology

Introduction

Tatuya Wakana is a notable inventor based in Shimotsuga, Japan. He has made significant contributions to the field of compressor technology, particularly with his innovative designs that enhance efficiency and reduce noise.

Latest Patents

Wakana holds a patent for a rotary compressor. This rotary compressor features a cylinder that defines a cylinder chamber, housing a piston that includes a roller performing a revolving motion within the chamber. The design incorporates a vane that partitions the chamber into a suction chamber and a compression chamber. A small space is strategically provided to communicate with the compression chamber, minimizing noise generated by pressure fluctuations while preventing refrigerant loss.

Career Highlights

Wakana is currently employed at Hitachi, Ltd., where he continues to develop advanced technologies in the field of compressors. His work has been instrumental in improving the performance and reliability of rotary compressors, making them more efficient for various applications.

Collaborations

Wakana has collaborated with esteemed colleagues such as Kenichi Oshima and Minoru Ooki. Their combined expertise has contributed to the successful development of innovative technologies in their field.

Conclusion

Tatuya Wakana's contributions to rotary compressor technology exemplify his commitment to innovation and efficiency. His patent reflects a deep understanding of engineering principles and a dedication to improving industrial applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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