This inventor holds 1 USPTO granted patent. Top assignee: Nagoya University. Active years: 2016.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2016
Title: Innovations of Tatsuyuki Hamano
Introduction
Tatsuyuki Hamano is a notable inventor based in Hachioji, Japan. He has made significant contributions to the field of materials science, particularly in the area of fullerene research. His innovative methods have paved the way for advancements in the recovery of valuable materials.
Latest Patents
One of his key patents is titled "Method for collecting metal-containing fullerene." This patent describes a method for recovering an endohedral metallofullerene through a complexation step involving a Lewis acid, such as titanium halide or tin halide. The process includes filtering the reaction solution to separate the complex and washing it to remove the Lewis acid, ultimately yielding a soluble endohedral metallofullerene. This method is notable for providing a high recovery yield of the endohedral metallofullerene, which is essential for various applications.
Career Highlights
Tatsuyuki Hamano is affiliated with Nagoya University, where he continues to engage in research and development. His work has garnered attention for its practical applications in material recovery and nanotechnology. With 1 patent to his name, he has established himself as a key figure in his field.
Collaborations
He has collaborated with esteemed colleagues such as Kazuhiko Akiyama and Hisanori Shinohara. These partnerships have contributed to the advancement of research in fullerene technology and have fostered a collaborative environment for innovation.
Conclusion
Tatsuyuki Hamano's contributions to the field of fullerene research exemplify the importance of innovation in material science. His patented methods not only enhance recovery processes but also open new avenues for research and application. His work continues to inspire future advancements in the field.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
