Location History:
- Ome, JP (2005)
- Tachikawa, JP (2013)
Company Filing History:
Years Active: 2005-2013
Title: **Tatsuya Tominari: Innovator in Semiconductor Technology**
Introduction
Tatsuya Tominari, located in Ome, Japan, is a distinguished inventor known for his contributions to semiconductor technology. With a total of two patents to his name, Tominari has made significant strides in improving the efficiency and reliability of semiconductor devices.
Latest Patents
Tominari's latest patents include a groundbreaking "Semiconductor device for performing photoelectric conversion." This innovation features an external base electrode with a two-layered structure comprising p-type polysilicon films. One layer is doped with a medium concentration of boron, while the other has a high concentration. This design reduces the resistance at the junction between the electrode and the intrinsic base layer, optimizing performance. Additionally, his patent on a "Method for manufacturing semiconductor device" outlines an innovative manufacturing process for hetero-junction bipolar transistors. This method ensures the removal of oxide films and enhances the reliability of the semiconductor devices.
Career Highlights
Tatsuya Tominari has had a reputable career, working at prominent companies such as Hitachi, Ltd. and Hitachi ULSI Systems Co., Ltd. His experiences at these organizations allowed him to hone his expertise in semiconductor technologies and contribute significantly to the field.
Collaborations
Throughout his career, Tominari has collaborated with notable colleagues including Takashi Hashimoto and Tomoko Jinbo. These partnerships have enriched his work and led to innovative developments in semiconductor design and manufacturing processes.
Conclusion
Tatsuya Tominari exemplifies the spirit of innovation in semiconductor technology. With his inventive solutions and collaborations with esteemed professionals, he continues to push the boundaries of what is possible in the field, ensuring advancements that benefit the industry and society at large.