Company Filing History:
Years Active: 2018-2019
Title: Tatsuya Nakauchi: Innovator in Semiconductor Polishing Technologies
Introduction
Tatsuya Nakauchi is a prominent inventor based in Kyoto, Japan. He has made significant contributions to the field of semiconductor polishing technologies, holding a total of three patents. His innovative work focuses on improving the efficiency and effectiveness of polishing compositions and methods used in semiconductor manufacturing.
Latest Patents
One of Nakauchi's latest patents is a polishing composition that includes hydroxyethyl cellulose, water, and abrasive grains. This composition is notable for its specific molecular weight range of hydroxyethyl cellulose, which is between 500,000 and 1,500,000. Additionally, the proportion of hydroxyethyl cellulose adsorbed to the abrasive grains is designed to be between 30% and 90%. Another significant patent is a method for polishing semiconductor substrates. This method includes an intermediate polishing step that aims to reduce surface defects to 45% or more of the total number of defects on the substrate surface, followed by a final polishing step to achieve a high-quality finish.
Career Highlights
Tatsuya Nakauchi is currently employed at Nitta Haas Inc., where he continues to develop innovative solutions in the semiconductor industry. His work has been instrumental in advancing polishing techniques that enhance the quality of semiconductor substrates.
Collaborations
Some of Nakauchi's notable coworkers include Masashi Teramoto and Noriaki Sugita. Their collaborative efforts contribute to the ongoing research and development in the field of semiconductor technologies.
Conclusion
Tatsuya Nakauchi's contributions to semiconductor polishing technologies through his patents and work at Nitta Haas Inc. highlight his role as an influential inventor in this specialized field. His innovative approaches continue to shape the future of semiconductor manufacturing.