Tatsuya Miura

Title: **Inventor Profile: Tatsuya Miura**

Introduction

Tatsuya Miura, an accomplished inventor based in Miyagi, Japan, has made significant contributions to the field of plasma processing technology. With two patents to his name, his work is instrumental in advancing the efficiency and effectiveness of substrate processing methods.

Latest Patents

Tatsuya Miura's latest patents include a **Temperature Control Method, Control Apparatus, and Plasma Processing Apparatus**. This temperature control method is designed for a plasma processing apparatus that allows for temperature setting adjustments for each stage of a multi-step plasma process. The method includes a transfer step for moving a workpiece into and out of the processing chamber, a process execution step for carrying out the plasma process, and a temperature control step that features both first and second temperature controls. The first control adjusts the temperature to the next process setting once a time execution of the plasma process is completed, while the second control manages the temperature in parallel with the entry and exit processes.

Another patent encompasses a **Substrate Processing Apparatus, Substrate Processing Method, and Substrate Processing Program**. This invention consists of a control unit that manages the substrate processing according to a predetermined procedure linked with multiple partial recipes. Each partial recipe is derived from dividing the processing procedure into specific functions, allowing for a streamlined and systematic approach to substrate processing.

Career Highlights

Currently, Tatsuya Miura is associated with Tokyo Electron Limited, a leading company in the semiconductor and electronic manufacturing sectors. His tenure at this prestigious company highlights his expertise and commitment to innovation in the technological landscape.

Collaborations

Throughout his career, Tatsuya Miura has had the opportunity to collaborate with talented individuals such as Wataru Ozawa and Kimihiro Fukasawa. These collaborations foster an environment of shared knowledge and creativity, driving further advancements in their respective fields.

Conclusion

Tatsuya Miura’s contributions to plasma processing and substrate management underscore his role as a notable inventor. With a keen focus on innovative solutions, he continues to shape the future of technology through his patents and ongoing work within the industry.