Osaka, Japan

Tatsuya Irifune

This inventor holds 2 USPTO granted patents and 10 published patent applications. Top assignees: C.i. Takiron Corporation, Bonset America Corporation. Active years: 2025-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tatsuya Irifune. Retrieved from https://idiyas.com/inventor/tatsuya-irifune

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 2 

% Patents Active = 50.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2025-2026

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2 patents (USPTO):Explore Patents

Title: Tatsuya Irifune: Innovator in Polyester-Based Shrink Film

Introduction

Tatsuya Irifune is a notable inventor based in Osaka, Japan. He has made significant contributions to the field of materials science, particularly in the development of polyester-based shrink films. His innovative work has led to advancements that enhance the performance and utility of these materials.

Latest Patents

Tatsuya Irifune holds a patent for a polyester-based shrink film. This film is characterized by its excellent predetermined impact resistance and a uniform shrinkage ratio near the shrinking temperature. His invention addresses critical needs in packaging and material applications, showcasing his expertise in polymer technology.

Career Highlights

Throughout his career, Tatsuya has worked with prominent companies, including C.I. Takiron Corporation and Bonset America Corporation. His experience in these organizations has allowed him to refine his skills and contribute to various innovative projects in the field of materials.

Collaborations

Tatsuya has collaborated with talented individuals such as Takuma Kaneko and Yuichiro Kanzaka. These partnerships have fostered a creative environment that has led to the development of cutting-edge technologies in the industry.

Conclusion

Tatsuya Irifune's contributions to the field of polyester-based materials exemplify the impact of innovation in modern technology. His work continues to influence the industry and inspire future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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