Tokyo, Japan

Tatsuya Hasebe

This inventor holds 1 USPTO granted patent. Top assignee: Hitachi, Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tatsuya Hasebe. Retrieved from https://idiyas.com/inventor/tatsuya-hasebe-guepucwn

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Tatsuya Hasebe: Inventor of an Annotation Device and Method.

Introduction

Tatsuya Hasebe is an inventor based in Tokyo, Japan, and works at Hitachi, Ltd. His patent work includes a system designed to make annotation of 3D shape data simpler and more accurate.

Latest Patents

Hasebe is associated with 1 patent, titled “Annotation Device and Annotation Method.” The invention describes a computer-implemented device that accepts a 3D CAD model, text, and label-definition information, then generates and stores an annotation dataset. Its annotation unit identifies partial shapes in the model and obtains related annotation information, including labels based on named entities in the text or label definitions. A metadata-generation unit links that information to the model’s partial shapes and to heterogeneous-format data derived from the model. The system is intended to support simple, highly accurate annotation.

Career Highlights

Hasebe’s documented patent contribution focuses on connecting textual labels and metadata with 3D CAD geometry. This approach can help organize and annotate engineering data across different formats.

Collaborations

Hasebe’s listed coworkers include Erika Watanabe and Makoto Onodera. The available information identifies them as colleagues but does not specify their roles in the patent.

Conclusion

Tatsuya Hasebe’s patent describes a structured method for associating annotations and metadata with 3D CAD models, reflecting his documented innovation work at Hitachi, Ltd.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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