Tokyo, Japan

Tatsuro Yoshida


Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 7(Granted Patents)


Company Filing History:


Years Active: 2007

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1 patent (USPTO):Explore Patents

Title: Innovations of Tatsuro Yoshida

Introduction

Tatsuro Yoshida is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of substrate supporting technology. His innovative approach has led to the development of a unique apparatus that utilizes the Bernoulli theorem.

Latest Patents

Yoshida holds a patent for a substrate supporting apparatus. This apparatus is designed to support a substrate or wafer in a non-contact state, utilizing the principles of the Bernoulli theorem. The invention comprises a housing, a rotatable chuck, and a cylindrical nozzle member. The chuck supports the substrate while the nozzle member discharges gas to hold the substrate in a non-contact state. This innovative design allows for efficient handling of substrates during various processes.

Career Highlights

Yoshida is associated with Sipec Corporation, where he has been instrumental in advancing substrate technology. His work has garnered attention for its practical applications in various industries. His dedication to innovation has positioned him as a key figure in his field.

Collaborations

Yoshida collaborates with Minoru Matsuzawa, contributing to the development of cutting-edge technologies. Their partnership has fostered a creative environment that encourages the exploration of new ideas and solutions.

Conclusion

Tatsuro Yoshida's contributions to substrate supporting technology exemplify the spirit of innovation. His patent and work at Sipec Corporation highlight his commitment to advancing technology in meaningful ways.

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