Yokohama, Japan

Tatsuro Osada

This inventor holds 1 USPTO granted patent. Top assignee: Socionext Inc.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tatsuro Osada. Retrieved from https://idiyas.com/inventor/tatsuro-osada-yygto2p3

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Innovations by Tatsuro Osada

Introduction

Tatsuro Osada is a notable inventor based in Yokohama, Japan. He has made significant contributions to the field of monitoring technology. His work focuses on developing advanced systems that enhance the efficiency of monitoring processes.

Latest Patents

Tatsuro Osada holds a patent for a "Monitoring device, monitoring system, and monitoring method." This innovative device includes a memory and a processor configured to execute a process that involves acquiring image data indicating a change in intensity of incident light from a sensor array. The device determines a first region to be monitored and a second region not to be monitored within the field of view of the sensor array. It outputs a monitoring result of a moving object based on the image data acquired by the sensor array in the first region. He has 1 patent to his name.

Career Highlights

Osada is currently employed at Socionext Inc., where he continues to develop cutting-edge technologies. His work at the company has positioned him as a key player in the advancement of monitoring systems.

Collaborations

He collaborates with Soichi Hagiwara, contributing to innovative projects within the company.

Conclusion

Tatsuro Osada's contributions to monitoring technology exemplify the impact of innovative thinking in the field. His patent and ongoing work at Socionext Inc. highlight his commitment to advancing technology for practical applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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