Nagano, Japan

Tatsuo Nakazawa

This inventor holds 1 USPTO granted patent. Top assignee: Yazaki Corporation. Active years: 1997.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tatsuo Nakazawa. Retrieved from https://idiyas.com/inventor/tatsuo-nakazawa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 13(Granted Patents)


Company Filing History:


Years Active: 1997

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1 patent (USPTO):Explore Patents

Title: Innovations of Tatsuo Nakazawa in Thin Film Technology

Introduction

Tatsuo Nakazawa is a notable inventor based in Nagano, Japan. He has made significant contributions to the field of thin film technology, particularly in the production of copper-indium-sulfur-selenium films. His innovative approaches have the potential to impact various applications in electronics and energy.

Latest Patents

Tatsuo Nakazawa holds a patent for a process for producing copper-indium-sulfur-selenium thin films. This process involves subjecting an electro-conductive substrate to an electrodeposition treatment in the presence of copper sulfate, indium sulfate, selenium dioxide, and thiourea. Additionally, he has developed a method for producing chalcopyrite crystals using similar materials and techniques, followed by a heat treatment.

Career Highlights

Nakazawa is associated with Yazaki Corporation, where he applies his expertise in materials science and engineering. His work has contributed to advancements in the production of thin films, which are essential for various technological applications.

Collaborations

Some of his notable coworkers include Tomio Hirano and Takeshi Kamiya. Their collaborative efforts have further enhanced the research and development in the field of thin film technology.

Conclusion

Tatsuo Nakazawa's innovative work in the production of copper-indium-sulfur-selenium thin films showcases his significant contributions to materials science. His patents and collaborations reflect a commitment to advancing technology in this important area.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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