Tokyo, Japan

Tatsumoto Nakahama

This inventor holds 1 USPTO granted patent and 2 published patent applications and 2 EPO patents. Top assignee: Eneos Materials Corporation. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tatsumoto Nakahama. Retrieved from https://idiyas.com/inventor/tatsumoto-nakahama

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

% Patents Active = 100.0

 

Average Co-Inventor Count = 7.0

ph-index = 1


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: Innovations of Tatsumoto Nakahama

Introduction

Tatsumoto Nakahama is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of polymer science. His work focuses on developing advanced materials that have practical applications in various industries.

Latest Patents

Tatsumoto Nakahama holds a patent for a block polymer, polymer composition, and adhesive. This innovative block polymer includes two or more polymer blocks, each having a value β of 0.20 or less. The polymer features a functional group containing at least one element selected from nitrogen, silicon, oxygen, and sulfur at the terminals of the polymer blocks. The block polymer is characterized by a value α of 0.75 or more, which enhances its performance in various applications.

Career Highlights

Tatsumoto Nakahama is currently employed at Eneos Materials Corporation, where he continues to advance his research in polymer technology. His work has been instrumental in developing new materials that meet the demands of modern applications.

Collaborations

He collaborates with talented coworkers, including Toshimitsu Kikuchi and Hirofumi Senga. Together, they contribute to innovative projects that push the boundaries of polymer science.

Conclusion

Tatsumoto Nakahama's contributions to the field of polymer science are noteworthy. His innovative patent and ongoing work at Eneos Materials Corporation highlight his commitment to advancing material technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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