Yokkaichi, Japan

Tatsumasa Kobayashi

This inventor holds 2 USPTO granted patents. Top assignees: Susuka National College of Technology, Suzuka National College of Technology. Active years: 2003-2005.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tatsumasa Kobayashi. Retrieved from https://idiyas.com/inventor/tatsumasa-kobayashi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 3.0

ph-index = 2

Forward Citations = 8(Granted Patents)


Company Filing History:


Years Active: 2003-2005

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2 patents (USPTO):Explore Patents

Title: Innovations of Tatsumasa Kobayashi

Introduction

Tatsumasa Kobayashi is a notable inventor based in Yokkaichi, Japan. He has made significant contributions to the field of materials science, particularly in the development of alloy films. With a total of 2 patents, his work has implications for various industrial applications.

Latest Patents

Kobayashi's latest patents include a method for producing a tin-zinc alloy film and a method for producing a tin-nickel alloy film. The tin-zinc alloy film is created by stacking a tin layer and a zinc layer on a substrate, followed by heating to form a multilayered film through diffusion. Similarly, the tin-nickel alloy film is produced by stacking a tin layer and a nickel layer, which are then heated to achieve the desired alloy through diffusion.

Career Highlights

Throughout his career, Kobayashi has worked at institutions such as Suzuka National College of Technology. His research has focused on innovative methods for creating alloy films that enhance material properties and performance.

Collaborations

Kobayashi has collaborated with notable colleagues, including Hideyuki Kanematsu and Takeo Oki. Their joint efforts have contributed to advancements in the field of materials science.

Conclusion

Tatsumasa Kobayashi's work in developing methods for producing alloy films showcases his innovative spirit and dedication to advancing technology. His contributions continue to influence the field and inspire future research.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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