Yokohama, Japan

Tatsuji Noma

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Hitachi, Ltd.. Active years: 2005.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tatsuji Noma. Retrieved from https://idiyas.com/inventor/tatsuji-noma

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

Average Co-Inventor Count = 8.0

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 2005

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1 patent (USPTO):Explore Patents

Title: Tatsuji Noma: Innovator in Semiconductor Technology

Introduction

Tatsuji Noma is a prominent inventor based in Yokohama, Japan. He has made significant contributions to the field of semiconductor technology. His innovative work has led to the development of a unique semiconductor device that enhances electronic devices.

Latest Patents

Tatsuji Noma holds a patent for a semiconductor device and design support method of an electronic device using the same. This semiconductor device includes a semiconductor die with patterned circuitry, a plurality of terminals coupled to the die, and an indication providing signal noise information of at least one of the terminals. His inventive approach addresses critical challenges in electronic device design.

Career Highlights

Noma is associated with Hitachi, Ltd., a leading company in technology and innovation. His work at Hitachi has allowed him to explore and develop advanced semiconductor solutions. With a focus on enhancing electronic device performance, he has established himself as a key figure in the industry.

Collaborations

Tatsuji Noma has collaborated with notable colleagues such as Satoshi Nakamura and Hitoshi Yokota. These partnerships have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Tatsuji Noma's contributions to semiconductor technology exemplify the spirit of innovation. His patent and work at Hitachi, along with collaborations with esteemed colleagues, highlight his impact on the field. His dedication to advancing technology continues to inspire future developments in electronic devices.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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