Tatsuhiko Tanimura

Title: Innovations of Tatsuhiko Tanimura

Introduction

Tatsuhiko Tanimura is a notable inventor based in Nirasaki, Japan. He has made significant contributions to the field of film-forming technology. His innovative work has led to the development of a unique patent that enhances the efficiency of film formation processes.

Latest Patents

Tanimura holds a patent for a film-forming method and film-forming apparatus. This method involves forming a first film by performing an operation that includes supplying a first raw material gas containing a first element to a substrate. The process also requires the first raw material gas to be adsorbed onto the substrate, followed by the supply of a first reaction gas. Additionally, a second film is formed on the substrate through a similar operation, which includes supplying a second raw material gas containing a second element. The result is a mixed film created by performing the film formation processes for both the first and second films.

Career Highlights

Tatsuhiko Tanimura is currently employed at Tokyo Electron Limited, a leading company in the semiconductor and electronics industry. His work at this organization has allowed him to further develop his expertise in film-forming technologies. Tanimura's innovative contributions have positioned him as a key figure in his field.

Collaborations

Tanimura has collaborated with notable colleagues such as Toru Kanazawa and Toshiyuki Ikeuchi. These collaborations have fostered a creative environment that encourages the exchange of ideas and advancements in technology.

Conclusion

Tatsuhiko Tanimura's contributions to film-forming technology exemplify the spirit of innovation. His patent and work at Tokyo Electron Limited highlight his commitment to advancing the field. His collaborations with esteemed colleagues further enhance the impact of his inventions.