Osaka, Japan

Tatsuhiko Kadowaki

This inventor holds 2 USPTO granted patents. Top assignee: Kubota Corporation. Active years: 1991-1992.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tatsuhiko Kadowaki. Retrieved from https://idiyas.com/inventor/tatsuhiko-kadowaki

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.4

ph-index = 2

Forward Citations = 4(Granted Patents)


Location History:

  • Osaka, JP (1991)
  • Ibaraki, JP (1992)

Company Filing History:


Years Active: 1991-1992

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2 patents (USPTO):Explore Patents

Title: Innovations by Tatsuhiko Kadowaki

Introduction

Tatsuhiko Kadowaki is a notable inventor based in Osaka, Japan. He has made significant contributions to the field of magnetic recording technology. With a total of 2 patents, Kadowaki's work focuses on enhancing the performance of magnetic recording media.

Latest Patents

Kadowaki's latest patents include a magnetic recording medium of thin metal film type. This medium boasts excellent noise characteristics and comprises a metal magnetic film formed on a nonmagnetic substrate. The film is made of either a Co-Cr-Nb alloy or a Co-Cr-Ni-Nb alloy. Additionally, he has developed another magnetic recording medium that features a low noise level, utilizing a magnetic film made of a Co-Ni-Cr-P alloy.

Career Highlights

Kadowaki is associated with Kubota Corporation, where he continues to innovate in the field of magnetic recording technologies. His work has been instrumental in advancing the capabilities of magnetic recording media.

Collaborations

Some of his notable coworkers include Toshiaki Morichika and Toshio Tani. Their collaborative efforts contribute to the ongoing advancements in their field.

Conclusion

Tatsuhiko Kadowaki's contributions to magnetic recording technology highlight his innovative spirit and dedication to improving media performance. His patents reflect a commitment to excellence in engineering and technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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