Tateo Ohhashi

Title: Tateo Ohhashi: Innovator in Thin-Film Formation Technology

Introduction

Tateo Ohhashi is a prominent inventor based in Kitaibaraki, Japan. He has made significant contributions to the field of thin-film formation technology, holding a total of six patents. His innovative approaches have advanced the manufacturing processes in this specialized area.

Latest Patents

One of Tateo Ohhashi's latest patents focuses on a method of manufacturing a member for thin-film formation apparatus. This invention addresses the challenge of preventing peeling of deposits formed on the surface of the inner walls of the apparatus. It also aims to suppress particle production without contaminating the interior of the apparatus. The patent describes a member for a thin-film formation apparatus that features inner walls, along with a method for manufacturing this member. A key aspect of the invention is the introduction of a plurality of unevenness on at least a portion of the surface of the member and the inner walls where unnecessary thin films are deposited. The surfaces undergo masking followed by etching processing to create the unevenness, after which the masking is removed.

Career Highlights

Throughout his career, Tateo Ohhashi has worked with notable companies, including Japan Energy Corporation and Nikko Kyodo Co., Ltd. His experience in these organizations has contributed to his expertise in thin-film technology and innovation.

Collaborations

Tateo Ohhashi has collaborated with several professionals in his field, including Hideaki Fukuyo and Atsushi Fukushima. These collaborations have likely enriched his work and led to further advancements in his inventions.

Conclusion

Tateo Ohhashi's contributions to thin-film formation technology exemplify his innovative spirit and dedication to improving manufacturing processes. His patents reflect a deep understanding of the challenges in this field and offer practical solutions that enhance efficiency and effectiveness.