Espoo, Finland

Tapio Uimonen


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 15(Granted Patents)


Company Filing History:


Years Active: 1986

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1 patent (USPTO):Explore Patents

Title: Tapio Uimonen: Innovator in Photometric Analysis

Introduction

Tapio Uimonen is a notable inventor based in Espoo, Finland. He has made significant contributions to the field of photometric analysis, particularly through his innovative methods aimed at improving measurement accuracy.

Latest Patents

Uimonen holds a patent for a method of eliminating measuring errors in photometric analysis. This invention addresses the challenges posed by temperature, air pressure, and disturbing material components that can affect measurement accuracy. The method involves generating a dark signal while blocking emitted radiation for detection. It also includes a reference signal that remains unaffected by the material component being measured. The invention ensures that any changes in the difference between the reference signal and measuring signal due to parametric changes are compensated for, thereby enhancing measurement reliability. The material components that can be measured using this method include CO₂, N₂O, and various anesthetic gases. Uimonen's patent is a testament to his innovative approach to solving complex problems in photometric analysis.

Career Highlights

Tapio Uimonen is associated with Instrumentarium Corporation, where he has contributed to advancements in medical technology and measurement systems. His work has been instrumental in developing solutions that enhance the accuracy and reliability of photometric measurements.

Collaborations

Uimonen has collaborated with notable colleagues such as Gosta J Ehnholm and Matti A Hakala. These collaborations have further enriched his work and contributed to the development of innovative solutions in the field.

Conclusion

Tapio Uimonen's contributions to photometric analysis through his patented methods demonstrate his commitment to innovation and excellence in measurement technology. His work continues to impact the field positively, ensuring more accurate and reliable measurements in various applications.

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