The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 24, 1986
Filed:
Apr. 03, 1984
Instrumentarium Corp., , FI;
Abstract
The invention relates to a method of eliminating the effect of temperature, air pressure and/or a disturbing material component or a like parameter in photometric analysis in which is generated a so-called dark signal, the passage of emitted radiation for detection being blocked at that time, a reference signal for one or more material components to be measured, said reference signal not being affected by said material component to be measured, as well as for each material component to be measured a measuring signal representing the amount of material component to be measured. According to the invention, whenever the difference between a reference signal and a measuring signal changes due to a change in any of the above parameters, there is generated a control signal which represents said parametric change and is proportional thereto, said control signal serving to change the difference between a reference signal and a dark signal in order to compensate for said parametric change. The material components to be measured may preferably comprise CO.sub.2, N.sub.2 O and/or one or more anesthetic gases.