Lincoln, RI, United States of America

Tao Chen

This inventor holds 1 USPTO granted patent. Top assignee: Arkwright, Inc.. Active years: 2002.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tao Chen. Retrieved from https://idiyas.com/inventor/tao-chen-h7hw7rwk

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 16(Granted Patents)


Company Filing History:


Years Active: 2002

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1 patent (USPTO):Explore Patents

Title: Innovations of Tao Chen in Ink-Jet Media Technology

Introduction

Tao Chen is an accomplished inventor based in Lincoln, RI (US). He has made significant contributions to the field of ink-jet media technology. His innovative work focuses on enhancing the performance and quality of ink-jet recording media.

Latest Patents

Tao Chen holds a patent for "Ink-jet media having high aqueous-based ink absorption capacity." This invention relates to ink-jet recording media that features an ink-receptive coating made from silica, water-dispersible alumina, and a hydrophilic, water-insoluble polyurethane resin. The unique polyurethane resin is capable of absorbing at least 200% by weight of water. The resulting media provide images with excellent color gamut, color density, and water-fastness.

Career Highlights

Tao Chen is currently employed at Arkwright, Inc., where he continues to develop innovative solutions in the field of ink-jet technology. His work has been instrumental in advancing the capabilities of ink-jet media, making it more efficient and effective for various applications.

Collaborations

Tao collaborates with talented professionals in his field, including his coworker Odette M Glass. Their combined expertise contributes to the ongoing success of their projects and innovations.

Conclusion

Tao Chen's contributions to ink-jet media technology demonstrate his commitment to innovation and excellence. His patent reflects a significant advancement in the industry, showcasing his ability to create solutions that enhance image quality and performance.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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