Tanmay Ghosh

Title: The Innovative Contributions of Tanmay Ghosh

Introduction

Tanmay Ghosh is a notable inventor based in Singapore, recognized for his significant contributions to the field of crystalline silicon technology. His work focuses on enhancing the methods of etching silicon, which is crucial for various applications in electronics and materials science.

Latest Patents

Tanmay Ghosh holds a patent titled "System and method for controlling directionality of fast-wet etching of crystalline silicon, c-Si." This patent describes a system and method for selectively switching the fast-wet-etching direction of crystalline silicon nanostructures between the different crystallographic planes of c-Si by a simple method of sample agitation. This innovative approach effectively allows for both anisotropic and isotropic wet-etching of c-Si, showcasing Ghosh's expertise in the field.

Career Highlights

Throughout his career, Tanmay Ghosh has worked with prestigious institutions such as the National University of Singapore and the Agency for Science, Technology and Research. His experience in these organizations has contributed to his development as a leading figure in his area of expertise.

Collaborations

Tanmay has collaborated with notable colleagues, including Utkur Mirsaidov and Michel Bosman. These partnerships have further enriched his research and innovation efforts.

Conclusion

Tanmay Ghosh's contributions to the field of crystalline silicon technology through his innovative patent and collaborations with esteemed colleagues highlight his role as a significant inventor. His work continues to influence advancements in materials science and technology.