San Diego, CA, United States of America

Tanhua Tian

This inventor holds 1 USPTO granted patent. Top assignee: Qualcomm Incorporated. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tanhua Tian. Retrieved from https://idiyas.com/inventor/tanhua-tian

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2026

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Tanhua Tian: Innovator in Electromagnetic Interference Shielding

Introduction

Tanhua Tian is a notable inventor based in San Diego, CA. He has made significant contributions to the field of electromagnetic interference (EMI) shielding. His innovative work has led to the development of advanced apparatuses and techniques that are essential for both test platforms and commercial devices.

Latest Patents

Tanhua Tian holds a patent for a "Structure for electromagnetic interference (EMI) shielding." This patent discloses apparatuses and techniques for fabricating devices used in various applications. The apparatus includes a non-conductive frame and a first shield structure, which is integral to the frame. The first shield structure features a first laser-activated surface structure, a first base metal, and a first plating metal, all working together to enhance EMI shielding.

Career Highlights

Tanhua Tian is currently employed at Qualcomm Incorporated, a leading technology company known for its innovations in telecommunications and semiconductor technology. His work at Qualcomm has allowed him to focus on cutting-edge research and development in EMI shielding technologies.

Collaborations

Tanhua collaborates with talented individuals such as Jordan Szabo and Ernest Soto. Their combined expertise contributes to the advancement of technologies in their field.

Conclusion

Tanhua Tian's contributions to EMI shielding demonstrate his commitment to innovation and excellence in technology. His work not only enhances device performance but also paves the way for future advancements in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…